Videos: Spring 2025 Fine Line Video Journal [March 26, 2025]
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Presentation: PLDC Improves Uniformity and Linearity for All Masks by Aki Fujimura, D2S [February 25, 2025]
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Event: Save the Date for the PMJ 2025 Finale hosted by the eBeam Initiative. Friday, April 18 right after the final session in the PMJ program and in the same room, the Annex Hall, Pacifico Yokohama.
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Press: eBeam Initiative Member Companies to Take Center Stage at SPIE Advanced Lithography and Patterning Conference [February 18, 2025]
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Survey: 2025 Deep Learning Applications List by eBeam Initiative members [February 18, 2025]
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Event:
eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 25, 2025
Videos: Autumn 2024 Fine Line Video Journal [October 28, 2024]
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Survey: 2024 eBeam Initiative Luminaries Survey Results [October 1, 2024]
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Press:
eBeam Initiative Survey of Semiconductor Luminaries Predicts Photomask Market Growth and Increasing Investments in Mask Inspection and Multi-beam Mask Writing [October 1, 2024]
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Japanese,
Chinese &
Traditional Chinese
Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 1, 2024
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Presentation: Lithography Technologies to Support High Performance Computing and Advancing AI by Toshiyuki Hisamura, Principal Member of Technical Staff for Silicon Technology at AMD [July 15, 2024]
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Videos: Summer 2024 Fine Line Video Journal [June 18, 2024]
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Videos: Spring 2024 Fine Line Video Journal [March 26, 2024]
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Presentation: We’ve Come A Long Way in 15 Years by Aki Fujimura, CEO of D2S and co-founder of the eBeam Initiative [February 27, 2024]
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Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.
Read the story of the eBeam Initiative
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.
Semiconductor Engineering: Reflecting on the SPIE Advanced Lithography + Patterning Symposium 2025 by Dr. Harry Levinson [March 20, 2025]
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Semiconductor Engineering: EUV’s Future Looks Even Brighter [February 20, 2025]
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Semiconductor Engineering: Improving Uniformity and Linearity for All Masks by Aki Fujimura, D2S [January 29, 2025]
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Semiconductor Digest: 2025: The Future is Bright for the Photomask Industry [January 3, 2025]
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Semiconductor Engineering: Luminary Panel Sees Progress In EUV Pellicle Adoption As Critical For EUV [November 21, 2024]
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MyNavi: Photomask market expected to grow positively in 2024, according to eBeam Initiative [November 20, 2024]
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Semiconductor Engineering: Luminary Panel Sees Multi-Beam Mask Writers And Curvilinear Masks Key To 193i And EUV [October 24, 2024]
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