Presentation: PLDC Improves Uniformity and Linearity for All Masks by Aki Fujimura, D2S [February 25, 2025]
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Event: Save the Date for the PMJ 2025 Finale hosted by the eBeam Initiative
Friday, April 18 right after the final session in the PMJ program and in the same room, the Annex Hall, Pacifico Yokohama.
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Press: eBeam Initiative Member Companies to Take Center Stage at SPIE Advanced Lithography and Patterning Conference [February 18, 2025]
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Survey: 2025 Deep Learning Applications List by eBeam Initiative members [February 18, 2025]
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Event:
eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 25, 2025
Survey: 2024 eBeam Initiative Luminaries Survey Results [October 1, 2024]
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Press:
eBeam Initiative Survey of Semiconductor Luminaries Predicts Photomask Market Growth and Increasing Investments in Mask Inspection and Multi-beam Mask Writing [October 1, 2024]
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Japanese,
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Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 1, 2024
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Presentation: Lithography Technologies to Support High Performance Computing and Advancing AI by Toshiyuki Hisamura, Principal Member of Technical Staff for Silicon Technology at AMD [July 15, 2024]
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Videos: Summer 2024 Fine Line Video Journal [June 18, 2024]
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Videos: Spring 2024 Fine Line Video Journal [March 26, 2024]
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Presentation: We’ve Come A Long Way in 15 Years by Aki Fujimura, CEO of D2S and co-founder of the eBeam Initiative [February 27, 2024]
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Mission | The Initiative provides a forum for educational and promotional activities regarding a new design-to-manufacturing approach, known as Design for e-beam (DFEB), that reduces mask costs for semiconductor devices.
Technology | DFEB is a design and software approach to enhance the throughput of e-beam lithographic exposure. DFEB uses character projection (CP) technology combined with design and software techniques to reduce a design's required shot count, resulting in increased CP e-beam direct-write (EbDW) throughput.
Applications | Systems companies seeking all-layer custom SoC prototypes; low-to-mid-volume semiconductor companies producing maskless test chips, engineering samples, and derivative chips; and supercomputing applications.
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
Marty Deneroff, D. E. Shaw Research
Jack Harding, eSilicon Corporation
Colin Harris, PMC-Sierra
Riko Radojcic, Qualcomm
Jean-Pierre Geronimi, STMicroelectronics
Semiconductor Engineering: EUV’s Future Looks Even Brighter [February 20, 2025]
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Semiconductor Engineering: Improving Uniformity and Linearity for All Masks by Aki Fujimura, D2S [January 29, 2025]
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Semiconductor Digest: 2025: The Future is Bright for the Photomask Industry [January 3, 2025]
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Semiconductor Engineering: Luminary Panel Sees Progress In EUV Pellicle Adoption As Critical For EUV [November 21, 2024]
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MyNavi: Photomask market expected to grow positively in 2024, according to eBeam Initiative [November 20, 2024]
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Semiconductor Engineering: Luminary Panel Sees Multi-Beam Mask Writers And Curvilinear Masks Key To 193i And EUV [October 24, 2024]
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Semiconductor Digest: eBeam Initiative Survey of Semiconductor Luminaries Predicts Photomask Market Growth and Increasing Investments in Mask Inspection and Multi-beam Mask Writing [October 1, 2024]
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