The eBeam Initiative

Features

Survey: 2024 eBeam Initiative Luminaries Survey Results [October 1, 2024]
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Press: eBeam Initiative Survey of Semiconductor Luminaries Predicts Photomask Market Growth and Increasing Investments in Mask Inspection and Multi-beam Mask Writing [October 1, 2024]
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Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 1, 2024
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Presentation: Lithography Technologies to Support High Performance Computing and Advancing AI by Toshiyuki Hisamura, Principal Member of Technical Staff for Silicon Technology at AMD [July 15, 2024]
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Videos: Summer 2024 Fine Line Video Journal [June 18, 2024]
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Videos: Spring 2024 Fine Line Video Journal [March 26, 2024]
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Presentation: We’ve Come A Long Way in 15 Years by Aki Fujimura, CEO of D2S and co-founder of the eBeam Initiative [February 27, 2024]
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Presentation: Cell Projection to Extend Shaped-Beam-Litho for New Applications by Matthias Slodowski, Vistec Electron Beam [February 27, 2024]
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Press: eBeam Initiative Marks 15 Year Anniversary – FUJIFILM Corporation Joins the eBeam Initiative [February 27, 2024]
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Survey: 2024 Deep Learning Applications List by eBeam Initiative members [February 27, 2024]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.

Read the story of the eBeam Initiative

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Aki Fujimura, CEO of D2S, sits down with Jed Rankin of IBM to discuss his leadership of the BACUS Steering Committee and changing the SPIE PUV Conference.	Harry Levinson of HJL Lithography summarizes key developments at SPIE-PUV 2024.
Glen Scheid of Micron, Harry Levinson of HJL Lithography, and Naoya Hayashi of DNP (pictured left to right) debate the results of this year’s Luminaries Survey during SPIE PUV with Aki Fujimura as moderator. In Part 1, the panelists cover the state of the mask industry, growing equipment investments, actinic inspection, high-NA EUV broad adoption and stitching of high-NA EUV masks. Part 2 covers mask writer costs, EUV pellicles, curvilinear ILT and the extendibility of 193i.	Jan Willis presents the results of this year’s Luminaries Survey on future business and technology trends. Key takeaways include: high confidence in photomask market growth and increasing equipment investments; growing confidence in non-EUV reaching 5nm; and high expectations that stitching for high-NA EUV masks will require designers to be aware of the stitching boundaries during design.
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eBeam Industry News

Semiconductor Engineering: Luminary Panel Sees Progress In EUV Pellicle Adoption As Critical For EUV [November 21, 2024]
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MyNavi: Photomask market expected to grow positively in 2024, according to eBeam Initiative [November 20, 2024]
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Semiconductor Engineering: Luminary Panel Sees Multi-Beam Mask Writers And Curvilinear Masks Key To 193i And EUV [October 24, 2024]
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Semiconductor Digest: eBeam Initiative Survey of Semiconductor Luminaries Predicts Photomask Market Growth and Increasing Investments in Mask Inspection and Multi-beam Mask Writing [October 1, 2024]
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Semiconductor Engineering: Semiconductor Photomask Market Poised for Another Year of Growth by Jan Willis, eBeam Initiative [September 19, 2024]
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Silicon Semiconductor: Why the Mask World is Moving to Curvilinear [August 29, 2024]
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Semiconductor Engineering: Key Technologies To Extend EUV To 14 Angstroms [July 29, 2024]
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