The eBeam Initiative

Features

Videos: Autumn 2025 Fine Line Video Journal [November 5, 2025]
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Survey: 2025 eBeam Initiative Luminaries Survey Results [September 23, 2025]
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Presentation: Technology Analysis of Leading-Edge Semiconductor Manufacturing, Tetsuya Wadaki, Morgan Stanley MUFG [September 23, 2025]
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Press: eBeam Initiative Survey Predicts Continued Growth in Photomask Market This Year - AGC Joins eBeam Initiative [September 23, 2025]
>> English, Japanese, Simplified Chinese & Traditional Chinese

Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 5:00–7:15pm Sept. 23, 2025
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Videos: Summer 2025 Fine Line Video Journal [June 3, 2025]
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Presentation: Full-Reticle Curvilinear Inline Linearity Correction Including Variable Bias with Zero Turnaround Time by Paris Spinelli, Micron, at PMJ 2025 [April 18, 2025]
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Presentation: Three Ways to Improve Wafer Uniformity by Aki Fujimura, D2S at PMJ 2025 [April 18, 2025]
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Videos: Spring 2025 Fine Line Video Journal [March 26, 2025]
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Presentation: PLDC Improves Uniformity and Linearity for All Masks by Aki Fujimura, D2S [February 25, 2025]
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Event: Save the Date for the PMJ 2025 Finale hosted by the eBeam Initiative. Friday, April 18 right after the final session in the PMJ program and in the same room, the Annex Hall, Pacifico Yokohama.
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Press: eBeam Initiative Member Companies to Take Center Stage at SPIE Advanced Lithography and Patterning Conference [February 18, 2025]
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Survey: 2025 Deep Learning Applications List by eBeam Initiative members [February 18, 2025]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 25, 2025

Videos: Autumn 2024 Fine Line Video Journal [October 28, 2024]
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Survey: 2024 eBeam Initiative Luminaries Survey Results [October 1, 2024]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches based on electron beam (eBeam) technologies. The goals of the eBeam Initiative are to reduce the barriers to adoption to enable more IC design starts and faster time-to-market while increasing the investment in eBeam technologies.

Read the story of the eBeam Initiative

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Abhishek Shendre of D2S explains how PLDC enables the manufacturability of curvy mask shapes for improved wafer quality. Leo Pang of D2S presents the paper in Chinese.	Jan Willis presents the results of this year's Luminaries Survey on future business and technology trends.
Katsuya Ueno, GM of AGC Blanks Division, provides an overview of AGC's EUV mask blank business. AGC is the eBeam Initiative's newest member.	Jim Wiley, Chan-Uk Jeon, and Harry Levinson (pictured left to right) debate the results of this year's Luminaries Survey at the eBeam Initiative annual reception, moderated by Aki Fujimura.
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eBeam Industry News

Asianometry: TSMC’s Incredible 2nm Curvy Masks [November 2, 2025]
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36KR European Central Station: Full-chip ILT Dialogue with Lithography Expert Dr. Leo Pang [October 31, 2025]
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Semiconductor Engineering: Expert Panel Sees History of Continuous Photomask Innovations as Key to the Future [October 27, 2025]
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Semiconductor Digest: eBeam Initiative Survey of Semiconductor Luminaries Predicts Continued Growth in Photomask Market This Year. [September 23, 2025]
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Semiconductor Digest: PLDC: A Robust MPC Solution for Any Mask Shape With Zero Impact on Turnaround Time [September 05, 2025]
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EE Times: U.S. Startups Debut First E-Beam Tools for Wafer Writing [August 11, 2025]
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Semiecosystem: Multibeam Obtains Funding For Next-Gen E-Beam Lithography [July 31, 2025]
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